All-in-One Ion Implanter PRODUCTS Product Information

The SAion is an ion implanter for 300-mm wafers with all the refined optical, transfer, and control systems.
It features a wide energy dose range covering the combined range of conventional medium-current and high-current ion implanters and enables many of the implantation processes in semiconductor device manufacturing to be processed with the implanter. In particular, with more than double the beam current throughout almost the entire operating range (when compared to a medium-current system), this ion implanter achieves a significant improvement in productivity.

In terms of quality, the SAion successfully reduces fine particles, which is a factor that reduces important yields in the semiconductor device manufacturing process, while achieving a mechanical throughput of 500 pieces per hour thanks to a newly designed transfer system. With regard to important beam quality information such as the beam divergence angle and parallelism, which were being substituted with measurements at locations different from the wafer surface, the SAion is the first ion implanter that enables them to be measured and controlled on the wafer surface.

The performance and functionality that characterize the SAion are designed to be applied not only to 300-mm wafers, which is the main process in the current generation, but also to 450-mm wafers to be processed in the future, enabling smooth process transfer in the future.

The SAion is the 6th generation of ion implanters featuring high productivity, implantation quality, and wide operational flexibility built on the concept of facilitating a process transfer in the future.