イオン注入技術国際会議2024(IIT)の協賛及び論文発表のお知らせ

 

9月23~26日に富山国際会議場で開催されるイオン注入技術国際会議(IIT2024)にプラチナスポンサーとして協賛出展し、下記の論文を発表します。

ぜひご参加ください。IIT2024の詳細は、こちらを参照ください。

 

【オーラル発表】

・ Validation of Three-Dimensional Simulation of Beam Transport Using Linear Accelerator Based on Measured Phase-Space Distributions

　by Yuma Hirai

・A Sophisticated Model for the Space Charge Effect

　by Mitsuaki Kabasawa

・Characterization of Low Energy Molecular Phosphorus Implant under Low Thermal Budget Anneal

　by TaeHoon Huh

・Novel vaporization method for gallium ion generation

　by Shiro Ninomiya

 

【ポスター発表】

・Measurement of phase-space distributions with varied parameters of an indirectly heated cathode ion source

　by Yugo Saito

・ Development of Automatic Wafer Transfer Adapters for Thin and Small Diameter Wafers of SiC and GaN

　by Kazuya Yoshitake

・Adverse Effect of Energetic Dopant Cross-Contamination on Sheet Resistance

　by Shoma Handa

・High-energy channeling implantation in SiC substrates with precise angle control of SS-UHE

　by Akichika Ono

・Observation of Angle Fluctuation Utilizing Plane Channel

　by Takuya Sakaguchi

・ Dose Matching at High Tilt Angle by Off-axis Implantation

　by Sho Kawatsu

・Optimization of Ion Source Structure for Enhancing Beam Current of Multiply Charged Ions

　by Daisuke Kuwahara

・Attempt to generate copper ions using the vaporizer method

　by  Shiro Ninomiya